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Thin-Film Thickness Measure

thin-film thickness tester
Thin-Film Thickness Measure
Made in China

SM200 is an automatic thin film thickness mapper developed by utilizing the principle of thin film reflected light interference. It uses the light with the widest wavelength range of 200-1700nm to vertically incident on the surface of the thin film. As long as the thin film has a certain degree of transmission, the SM200 can calculate the thickness of the film according to the reflected interference spectrum, as well as other optical constants such as reflectivity. , refractive index and extinction coefficient, etc., the thickness of the maximum mapping range can reach 1nm ~ 250um.
The SM200 automatic optical thin film thickness mapper is constructed by the surveying and mapping host, the surveying and mapping platform, the Y-type optical fiber and the host computer software. The leading generation of automated optical film thickness gauges.

  • Wide film thickness range(1nm ~ 250um
  • Wide wavelength range (200-1700nm
  • Non-contact, non-destructive testing system
  • Ultra-long life light source, higher luminous efficiency
  • Compact and affordable without compromising high precision
  • High-resolution, high-sensitivity spectrometer, the measurement results are more accurate and reliable
  • The software interface is intuitive, and the operation is convenient and time-saving
  • Historical data storage to help users better grasp the results
  • Optical constant analysis (n: Refractive index, k: Extinction coefficient) with Non-linear Least-Squares Method
  • Analytical algorisms are Peak-Valley Method, Fast Fourier Transformation (FFT) Method, Non-linear Least-Squares Method and Optimization Method
Virtually all smooth, translucent or low absorption coefficient films can be mapped, which includes almost all dielectric and semiconductor materials, including silicon dioxide,nitriding layer,diamond-like carbon,polycrystalline silicon,polycrystalline silicon,photoresist,macromolecule,polyimide,amorphous silicon,etc.

Optical glass of Ohara and Schott

Plastic:Acrylic,Acrylate,Lucite,Perspex,Plexiglass,PET,Estar,Melinex,Mylar,Polyacrylate,Polyethylene,PE,Polyethene,Styrene - acrylanitrile,Styrene.
Semiconductor, Compound semiconductor:Aluminum gallium arsenide,Aluminium oxide,Aluminium compounds,CdTe,CoSi2,GaN,GaAs,GaP,GaSb,Indium compounds,Magnesium compounds,Si,Silicon compounds,HfO2,PbS,PbSe,
Metal target material:
​​​​​​​Others:AlCu,Cellulose,KCl,Quartz,Fused Silica,Fused Silica,Silica,Thermal Oxide,ThermalOxide​​​​​​​

  • Semiconductor coating: photoresist, oxide, desalination layer, silicon-on-insulator, wafer back grinding
  • Liquid crystal display: gap thickness, polyimide, ITO transparent conductive film
  • Optical coating: hard coating, anti-reflection layer
  • Microelectronic system: photoresist, silicon film, printed circuit board
  • Biomedical: medical equipment, Parylene