SM280 is a microfilm thickness mapper developed by utilizing the principle of reflection light interference of films. It uses the light with the widest wavelength range of 200-1700nm to be vertically incident on the surface of the film. As long as the film has a certain degree of transmission, the SM280 can calculate the film thickness according to the reflected interference spectrum, and other optical constants such as Reflectivity, refractive index and extinction coefficient, etc., the thickness of the maximum mapping range can reach 10nm ~ 100μm.
The SM280 automatic microscopic film thickness mapper adopts a microscopic system, which can further reduce the spot size, thereby achieving very good spatial resolution. At the same time, the SM280 adopts an integrated design. The core components use a high-resolution, high-sensitivity spectrometer and a high-precision 3-axis mobile platform. Combined with Optronics' unique algorithm technology, it provides users with a new generation of leading automatic microscopy film thickness Surveyor.
- Wide film thickness range（10nm ~ 100μm）
- Wide wavelength range （200-1700nm）
- Non-contact, non-destructive testing system;
- Fine spot, better spatial resolution;
- Ultra-long life light source, higher luminous efficiency;
- High-resolution, high-sensitivity spectrometer, more accurate and reliable mapping results;
- Compact and affordable without compromising high precision
- The software interface is intuitive, and the operation is convenient and time-saving;
- Integrated real-time camera to monitor measurement points;
- Equipped with a microscope objective lens to support the detection of small-sized samples;
- The surveying and mapping speed is fast, and it supports multi-point surveying and mapping point map drawing;
- Support drawing 2D/3D thickness distribution map of samples;
- High-precision, long-life 3-axis mobile platform;
- Historical data storage to help users better grasp the results;
- Optical constant analysis (n: Refractive index, k: Extinction coefficient) with Non-linear Least-Squares Method
- Analytical algorisms are Peak-Valley Method, Fast Fourier Transformation (FFT) Method, Non-linear Least-Squares Method and Optimization Method.
Virtually all smooth, translucent or low absorption coefficient films can be mapped, which includes almost all dielectric and semiconductor materials, including silicon dioxide,nitriding layer,diamond-like carbon,polycrystalline silicon,polycrystalline silicon,photoresist,macromolecule,polyimide,amorphous silicon,etc.
Optical glass of Ohara and Schott
Plastic:Acrylic,Acrylate,Lucite,Perspex,Plexiglass,PET,Estar,Melinex,Mylar,Polyacrylate,Polyethylene,PE,Polyethene,Styrene - acrylanitrile,Styrene.
Semiconductor, Compound semiconductor:Aluminum gallium arsenide,Aluminium oxide,Aluminium compounds,CdTe,CoSi2,GaN,GaAs,GaP,GaSb,Indium compounds,Magnesium compounds,Si,Silicon compounds,HfO2,PbS,PbSe,
Metal target material:Ag,Al,Au,Co,Cr,Cu,Ge,Mo,Nb,Ni,Pt,Rh,Ta,Ti,W
Others:AlCu,Cellulose,KCl,Quartz,Fused Silica,Fused Silica,Silica,Thermal Oxide,ThermalOxide
- Optical glass of Ohara and Schott
- Biomedical: medical equipment, Parylene
- Optical coating: hard coating, anti-reflection layer;
- Semiconductor coating: photoresist, oxide, desalination layer, silicon-on-insulator, wafer back grinding;
- Microelectronic system: photoresist, silicon film, printed circuit board;
- Liquid crystal display: gap thickness, polyimide, ITO transparent conductive film;